The pressure based MFC was introduced in the last decade and is now overtaking the use of the thermal MFC in critical etch applications. In 2002, Fugasity introduced a pressure base MFC

A robust product portfolio consisting of SAM and Aera brand analog, digital, and pressure insensitive MFCs provide leading edge Mass Flow Control functionality. The offering is further

The 1640 Pressure-based Mass Flow Controller is a metal-sealed instrument with standard 3-inch footprint, designed to meter and control gas flows in low-line pressure applications, such as

The control valve orifice determines the Flow Coefficient for the MFC and is carefully selected by the factory based on the min/max flow rate combined with the min/max Inlet Pressure and the min/max Outlet Pressure specified by the customer at the time of purchase. The Flow Coefficient (i.e. orifice size) is determined by the square root of the

A robust product portfolio consisting of SAM and Aera brand analog, digital, and pressure insensitive MFCs provide leading edge Mass Flow Control 

A mass flow controller (MFC) has a standard envelope with an enclosure and a corresponding base. A pressure transducer is communicatively coupled to a process gas in a proportional inlet valve without being physically coupled to the base. The space formerly occupied by the pressure transducer is available for additional component integration, or reduction of the standard envelope size.

MFC Type, Thermal, Thermal, Thermal, Thermal ; Full Scale Flow Range, sccm, 10 to 20,000, 5 to 50,000, 5 to 50,000, 5 to 50,000 

Brooks Instrument presents the theory of operation behind their pressure-based mass flow controller (P-MFC) from their GP200 series in this video. This P-MFC

The units feature a loop circuit, so even if there is a secondary pressure change or ambient temperature change that could affect the supply pressure of the 

Example 2 – pressure-based MFC: Traditional pressure- based MFCs measure pressure drop across a laminar flow element (LFE) (FIGURE 4). The valve must be placed upstream for two reasons. First, the pressure measurement is more accurate and stable if P2 is vacuum; second, this method requires a stable inlet pressure, P1. The downside to placing

The pressure based MFC was introduced in the last decade and is now overtaking the use of the thermal MFC in critical etch applications. In 2002, Fugasity introduced a pressure base MFC called the

Designed with exclusive alarm capabilities for early detection of potential process issues, the GP200 P-MFC enables precise and repeatable control for critical gas delivery applications and is fully pressure insensitive to dynamic inlet and outlet pressure conditions. Process gas accuracy is +/- 1% and repeatability is +/- 0.15% of set point.

In this second video Pete Singer, Editor-in-Chief, from Semiconductor Digest interviews Mohamed Saleem, PhD, Chief Technology Officer, Brooks Instrument. Moh

Most mass flow controllers have internal control valves that only operate with a limited differential pressure. · The solenoid actuated control valves in the 

A traditional P-MFC approach includes an upstream pressure transducer, an upstream control valve, two individual pressure transducers, and laminar flow element. The use of an upstream valve has

If the MFC valve had a maximum differential pressure limitation of 250 psig, this would work well for operating the reactor at its maximum steady state pressure (1200 psig). However, many research reactors are required to change pressure during the test cycle or they may require the dispensed gas to generate the initial reactor pressurization.